NH3 sensing properties of nanostructure ZnO thin film prepared by silar method

Corlu T., Karaduman I., YILDIRIM M. A. , ATEŞ A., Acar S.

HIGH TEMPERATURES-HIGH PRESSURES, vol.46, no.2, pp.155-165, 2017 (SCI-Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 46 Issue: 2
  • Publication Date: 2017
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.155-165
  • Süleyman Demirel University Affiliated: No


Ammonia (NH3) sensing characteristics of nanostructure ZnO thin film prepared by Successive Ionic Layer Adsorption and Reaction (SILAR) method are discussed in this paper. The structural and morphological characterizations of the film are performed by X-ray diffractometer (XRD) and Scanning Electron Microscope (SEM). The gas sensing characteristics have been studied by exposing the film to various concentrations of NH3 at different operating temperatures within the range of 37-77 degrees C. The nanostructured ZnO thin film has exhibited maximum gas response to 100 ppm NH3 gas exposure at 77 degrees C operating temperature.