Structural, morphological and optical properties of Yb2Cu2O5 thin films


JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol.30, no.21, pp.19457-19462, 2019 (SCI-Expanded) identifier identifier


The Yb2Cu2O5 thin films have been fabricated by ultrasonic spray pyrolysis followed by a high temperature annealing process. The as-deposited and annealed films are analyzed by well-known tools such as x-ray diffraction (XRD) and scanning electron microscope (SEM). The crystal structure of the Yb2Cu2O thin films is orthorhombic and their crystal size is 35.9 nm. The SEM images show that the surface of the Yb2Cu2O thin films is porous as a consequence of the high temperature treatment. The optical properties of Yb2Cu2O5 firstly deposited in a thin film form is also investigated by means of UV-Vis measurements. From Tauc plot, the indirect band gap value of 1.079 +/- 0.003 eV is reported for Yb2Cu2O thin films.