A new approach to deposit sulfur groups on paper has been evaluated in this study by radio-frequency (RF) SO2+O-2 plasma treatment. The survey and high-energy resolution XPS spectra provide clues to the site of modification on the paper surface. Relatively large variations in the deposited film-like layer composition can be realized by changing plasma parameters. In general, increasing RF-power provides effective implantation of sulfur, from 3.6% to 7.2%. It is clearly shown that elemental oxygen incorporation on paper directly depends on the relative ratio Of SO2/O-2.