Surface sulfonation of paper in SO2+O-2 plasmas - Hypotheses on reaction mechanisms

Sahin H. T. , Young R. A.

SCIENCE AND ENGINEERING OF COMPOSITE MATERIALS, vol.15, no.1, pp.79-86, 2008 (Journal Indexed in SCI) identifier

  • Publication Type: Article / Article
  • Volume: 15 Issue: 1
  • Publication Date: 2008
  • Title of Journal : SCIENCE AND ENGINEERING OF COMPOSITE MATERIALS
  • Page Numbers: pp.79-86

Abstract

A new approach to deposit sulfur groups on paper has been evaluated in this study by radio-frequency (RF) SO2+O-2 plasma treatment. The survey and high-energy resolution XPS spectra provide clues to the site of modification on the paper surface. Relatively large variations in the deposited film-like layer composition can be realized by changing plasma parameters. In general, increasing RF-power provides effective implantation of sulfur, from 3.6% to 7.2%. It is clearly shown that elemental oxygen incorporation on paper directly depends on the relative ratio Of SO2/O-2.