Radio frequency-H2O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods


Kiristi M., Gulec A. , Bozduman F., ÖKSÜZ L. , Oksuz A. U. , Hala A.

THIN SOLID FILMS, vol.567, pp.32-37, 2014 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 567
  • Publication Date: 2014
  • Doi Number: 10.1016/j.tsf.2014.07.035
  • Title of Journal : THIN SOLID FILMS
  • Page Numbers: pp.32-37

Abstract

Electron beam and radio frequency (RF: 13.56 MHz) magnetron sputtering methods were used to obtain a highly transparent and conductive indium tin oxide (ITO) films. The coated thin films were treated by RF-H2O plasma in order to improve optical and electrical properties. RF-H2O plasma characteristics were investigated by optical emission spectroscopy during surface treatments. X-ray photoelectron spectroscopy results on O 1s core levels indicated the activated oxygen species in both amorphous and crystalline ITO structures. The structural, electrical and optical properties of ITO film were characterized by scanning electron microscopy, X-ray diffraction, and four-probe techniques. After the RF-H2O plasma treatment, the ITO films exhibited lower resistivity and better transparency due to the formation of radical species. (C) 2014 Elsevier B.V. All rights reserved.