Radio frequency-H2O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods

Kiristi M., Gulec A., Bozduman F., ÖKSÜZ L., Oksuz A. U., Hala A.

THIN SOLID FILMS, vol.567, pp.32-37, 2014 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 567
  • Publication Date: 2014
  • Doi Number: 10.1016/j.tsf.2014.07.035
  • Journal Name: THIN SOLID FILMS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.32-37
  • Süleyman Demirel University Affiliated: Yes

Abstract

Electron beam and radio frequency (RF: 13.56 MHz) magnetron sputtering methods were used to obtain a highly transparent and conductive indium tin oxide (ITO) films. The coated thin films were treated by RF-H2O plasma in order to improve optical and electrical properties. RF-H2O plasma characteristics were investigated by optical emission spectroscopy during surface treatments. X-ray photoelectron spectroscopy results on O 1s core levels indicated the activated oxygen species in both amorphous and crystalline ITO structures. The structural, electrical and optical properties of ITO film were characterized by scanning electron microscopy, X-ray diffraction, and four-probe techniques. After the RF-H2O plasma treatment, the ITO films exhibited lower resistivity and better transparency due to the formation of radical species. (C) 2014 Elsevier B.V. All rights reserved.